4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Hellmut Joswig

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Antireflection layer and process for lithographically structurin

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for manufacturing a multi-layer gate electrode for a MOS

Fishing – trapping – and vermin destroying
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Process for reducing the reflectivity of sputtered films

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Profile ID: LFUS-PAI-P-125421

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