Process for reducing the reflectivity of sputtered films

Details Process for reducing the reflectivity of sputtered films Process for reducing the reflectivity of sputtered films

1990-11-30

1992-07-07

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419226, C23C 1434, C23C 1454

Patent

active

051280094

ABSTRACT:
A process for reducing the reflectivity of films which are produced by sputtering and are to be structured in semiconductor technology, especially a photographic technique, includes varying a process parameter at the end of the sputtering process resulting in a partial film mear the surface havaing reduced reflectivity while other properties of the film remain substantially the same.

REFERENCES:
patent: 4125446 (1978-11-01), Hartsough et al.
patent: 4139443 (1979-02-01), Sakurai
patent: 4657648 (1987-04-01), Nagarekawa et al.
D. Widman et al., "Technologie hochintegrierter Schaltungen" (Technology of Highly Integrated Circuits), Sec. 3.9, p. 95, Springer-Verlag, Berlin 1988.

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