Arrangement for exposing semiconductor wafers by means of a sync

Details Arrangement for exposing semiconductor wafers by means of a sync Arrangement for exposing semiconductor wafers by means of a sync

1987-07-15

1989-08-08

Fields, Carolyn E.

X-ray or gamma ray systems or devices

Specific application

Lithography

2504921, 2504922, G21K 510

Patent

active

048560375

ABSTRACT:
An arrangement or apparatus for exposing semiconductor wafers by means of a synchrotron radiation, wherein a mask and semiconductor wafer are movable in a common, perpendicular direction relative to the direction of the X-ray beam in order to sweep an exposure field. The optical devices are provided for observing adjustment marks on the mask and semiconductor wafer to create control signals for the adjustment of the mask and wafer relative to each other. The beam radiation is conducted in a tube having a rectangular slot-shaped radiation window, which is arranged immediately adjacent to the mask and the optical devices are provided next to the beam feed tube and aligned to a part of the exposure fields lying outside of the impingement area of the beam leaving the radiation window.

REFERENCES:
patent: 4238780 (1980-12-01), Doemens
patent: 4253112 (1981-02-01), Doemens
Muller "Overlay Measurements for X-ray Lithography" J. Vac. Sci. Technol. B., vol. 3, No. 1, Jan./Feb. 1985, pp. 2141-244.
Folchi et al "X-ray Lithography Mask Alignment Stage", IBM Techn. Discl. Bull. vol. 25, No. 12, May 1983, pp. 6400-6401.

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