4. Semiconductor device manufacturing: process
  5. Making field effect device having pair of active regions...
  6. Having insulated gate

Greg A. Hames

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Method of forming a transistor having an improved sidewall gate

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Oxide etch barrier formed by nitridation

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Transistor having an improved gate structure and method of...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having schottky gate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Transistor having an improved sidewall gate structure and...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Transistor having improved gate structure

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Junction field effect transistor
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Greg A. Hames does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Greg A. Hames, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Greg A. Hames will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-206895

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure