4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

George M. Jenkins

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Apparatus for destroying hazardous compounds in a gas stream

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...
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Coating of semiconductor wafers and apparatus therefor

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Coating of semiconductor wafers and apparatus therefor

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Gas supply device, particularly for manufacturing semiconductor

Coating apparatus – Solid member or material acting on coating after application – Running length work
Patent

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Profile ID: LFUS-PAI-P-880851

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