Coating of semiconductor wafers and apparatus therefor

Coating apparatus – Gas or vapor deposition – Work support

Patent

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Details

Other Related Categories

118500, C23C 1000

Type

Patent

Status

active

Patent number

048195790

Description

ABSTRACT:
In the production of coatings on semiconductor wafers, fragile equipment is used and also difficulties in obtaining uniform coatings arise. The invention provides a form of boat for holding wafers and a manifold structure for feeding gases to the boats, and wafers which are less fragile cheaper and easier to manufacture and give more uniform coatings. The boats are relatively short, of semi-cylindrical form with slots through which gas can flow, and with rails for positioning and holding wafers at correct heights. The manifolds have apertures which are spaced at varying distances along the manifold as compared to the conventional longitudinal slot. The invention is particularly applicable to producing oxide coatings and polycrystalline silicon coatings on silicon wafers.

REFERENCES:
patent: 3717121 (1973-02-01), Bruckbauer
patent: 4096822 (1978-06-01), Yamawaki
patent: 4098923 (1978-07-01), Alberti
patent: 4108106 (1978-08-01), Dozier
patent: 4203387 (1980-05-01), McMullen
patent: 4220116 (1980-09-01), Hochberg
patent: 4256053 (1981-03-01), Dozier
patent: 4466381 (1984-08-01), Jenkins

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