Coating of semiconductor wafers and apparatus therefor

Details Coating of semiconductor wafers and apparatus therefor Coating of semiconductor wafers and apparatus therefor

1983-06-28

1984-08-21

Smith, John D.

Coating apparatus

Gas or vapor deposition

Work support

118500, 427 95, H01L 2168

Patent

active

044663811

ABSTRACT:
In the production of coatings on semiconductor wafers, fragile equipment is used and also difficulties in obtaining uniform coatings arise. The invention provides a form of boat for holding wafers and a manifold structure for feeding gases to the boats, and wafers which are less fragile cheaper and easier to manufacture and give more uniform coatings. The boats are relatively short, of semi-cylindrical form with slots through which gas can flow, and with rails for positioning and holding wafers at correct heights. The manifolds have apertures which are spaced at varying distances along the manifold as compared to the conventional longitudinal slot. The invention is particularly applicable to producing oxide coatings and polycrystalline silicon coatings on silicon wafers.

REFERENCES:
patent: 3918756 (1975-11-01), Saville et al.
patent: 4069009 (1978-01-01), Yamawaki
patent: 4098923 (1978-07-01), Alberti et al.
patent: 4108106 (1978-08-01), Dozier
patent: 4203387 (1980-05-01), McMullen et al.
patent: 4220116 (1980-09-01), Hochberg
patent: 4256053 (1981-03-01), Dozier
patent: 4309240 (1982-01-01), Zaferes
Patent Abstracts of Japan vol. 3, No. 78, Jul. 5, 1979, p. 55E121 & JP-A-56376.
Patent Abstracts of Japan vol. 1, No. 146, Nov. 26, 1977, p. 7457E77 & JP-A-52-85476.
Patent Abstracts of Japan vol. 2, No. 20, Feb. 9, 1978, p. 11325E77 & JP-A-52-139379.

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