Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
Reexamination Certificate
2011-01-25
2011-01-25
Dinh, Paul (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
C716S051000, C716S052000, C716S053000, C716S054000, C716S055000
Reexamination Certificate
active
07877723
ABSTRACT:
Provided are a method of fabricating a semiconductor and an apparatus using the method, and more particularly, a method of effectively arranging assist features on the mask and an apparatus using the method. The method of arranging mask patterns includes separately calculating contributions of an assist feature to image intensity at an optimal focus and at a defocus position and placing the assist feature at a position where the contribution of the assist feature to the image intensity is greater at the defocus position than at the optimal focus position. The method includes a first operation of obtaining a first contribution function for contribution of an assist feature to image intensity at a main feature at a first focus position; a second operation of obtaining a second contribution function for contribution of the assist feature to the image intensity at the main feature at a second focus position; and a third operation of determining the position of the assist feature to be a position satisfying a condition that a linear combination of the first contribution function and the second contribution function exceeds a predetermined threshold value.
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English language abstract of Korean Publication No. 2006-0050603.
Li, et al., Rapid search of the Optimum placement of assist feature to improve the aerial image gradient in iso-line structure, 2007, SPIE, pp. 1-7.
Dinh Paul
Muir Patent Consulting, PLLC
Samsung Electronics Co,. Ltd.
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