4. Semiconductor device manufacturing: process
  5. Coating with electrically or thermally conductive material
  6. To form ohmic contact to semiconductive material

David B. Aldrich

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Dry process for post oxide etch residue removal

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Hydrogen plasma photoresist strip and polymeric residue...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Method for photoresist strip, sidewall polymer removal and...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Method for photoresist strip, sidewall polymer removal and...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Sidewalls for guiding the via etch

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified configuration
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1827281

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