4. Semiconductor device manufacturing: process
  5. Making device or circuit emissive of nonelectrical signal
  6. Including integrally formed optical element

Chuang-Chuang Tsai

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Method of annealing large area glass substrates

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate

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Method of annealing large area glass substrates

Coating processes – With pretreatment of the base – Heating or drying pretreatment
Reexamination Certificate

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Producing a sensor with doped microcrystalline silicon channel l

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Patent

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Sensor with doped microcrystalline silicon channel leads with bu

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Patent

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Profile ID: LFUS-PAI-P-905972

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