Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
Inventor
active
Chemical mechanical polish (CMP) planarizing trench fill method
Crack resistant multi-layer dielectric layer and method for...
Fabrication of FinFETs with multiple fin heights
HDP-CVD method for forming passivation layers with enhanced...
High performance strained channel MOSFETs by coupled stress...
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Profile ID: LFUS-PAI-P-318576