4. Coating apparatus
  5. Gas or vapor deposition

Christopher Olsen

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Fluorine plasma treatment of high-k gate stack for defect...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Gate electrode dopant activation method for semiconductor...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Gate electrode dopant activation method for semiconductor...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Method of forming a silicon oxynitride layer

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Thermal oxidation of silicon using ozone

Coating apparatus – Gas or vapor deposition
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Profile ID: LFUS-PAI-P-2316313

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