4. Active solid-state devices (e.g., transistors, solid-state diode
  5. Field effect device
  6. Having insulated electrode

Christophe Pomarede

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Incorporation of nitrogen into high k dielectric film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
Reexamination Certificate

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Incorporation of nitrogen into high k dielectric film

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

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Incorporation of nitrogen into high k dielectric film

Stock material or miscellaneous articles – All metal or with adjacent metals – Having composition – density – or hardness gradient
Reexamination Certificate

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Low temperature method of forming a gate stack with a high k...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Plasma etch resistant coating and process

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
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Profile ID: LFUS-PAI-P-2428314

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