Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-01-30
2007-01-30
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S907000
Reexamination Certificate
active
10974726
ABSTRACT:
A photoresist that is suitable for use in 157 nm photolithography includes a polymer based on fluorinated norbornene derivatives.
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Dammel et al., “Transparent Resins fro 157 nm Lithography,” pp. 350-360.
Abstract of Patterson et al., “Polymers for 157-nm photoresist applications: a progress report”, Proc. SPIE 3999, pp. 365-374.
Dammel Ralph
Hohle Christoph
Houlihan Michael Francis
AZ Electronic Materials USA Corp.
Chu John S.
Edell Shapiro & Finnan LLC
Infineon - Technologies AG
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