4. Chemistry: electrical and wave energy
  5. Processes and products
  6. Coating, forming or etching by sputtering

Charles W. Jurgensen

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Confinement device for use in dry etching of substrate...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate

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Confinement device for use in dry etching of substrate...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Reexamination Certificate

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Reduced stress tungsten deposition

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent

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Reduction of plasma damage at contact etch in MOS integrated...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Semiconductor wafer having a layer-to-layer alignment mark and m

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having substrate registration feature
Patent

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Profile ID: LFUS-PAI-P-575168

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