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Chan Lim

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Gap processing

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having air-gap dielectric
Reexamination Certificate

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High-k dielectric film, method of forming the same and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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High-k dielectric film, method of forming the same and...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate

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High-k dielectric film, method of forming the same and...

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
Reexamination Certificate

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High-k dielectric film, method of forming the same and...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate

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Profile ID: LFUS-PAI-P-540320

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