4. Drying and gas or vapor contact with solids
  5. Process
  6. Gas or vapor pressure varies during treatment

Bruce Alan Huling

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Diluted nitrogen trifluoride thermal cleaning process

Cleaning and liquid contact with solids – Processes – Including use of vacuum – suction – or inert atmosphere
Patent

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Nitrogen trifluoride thermal cleaning apparatus and process

Drying and gas or vapor contact with solids – Process – Gas or vapor pressure varies during treatment
Patent

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Semiconductor package structure for vertical mount and method

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – Device held in place by clamping
Reexamination Certificate

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Profile ID: LFUS-PAI-P-74307

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