Drying and gas or vapor contact with solids – Process – Gas or vapor pressure varies during treatment
Patent
1995-02-17
1998-08-25
Bennett, Henry A.
Drying and gas or vapor contact with solids
Process
Gas or vapor pressure varies during treatment
34 85, 34 92, 34408, 34409, F26B 504
Patent
active
057971951
ABSTRACT:
The present invention is a method and apparatus for the dynamic cleaning of semiconductor fabrication equipment and particularly quartzware with thermally activated nitrogen trifluoride wherein the cleaning effluent is safely removed and cleaning by-products isolated or diluted to provide for efficient cleaning and rapid restarts of fabrication equipment so cleaned.
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"Utilizing a portable cycle purge nitrogen venturi for removal of process gases in semiconductor processing gas systems." J. P. Fournier and Michael E. Elta; J. Vac. Sci. Technol. A 10(5), Sep./Oct. 1992; pp. 3376, 3377.
Engle George Martin
Huling Bruce Alan
Schneider Charles Anthony
Air Products and Chemicals Inc.
Bennett Henry A.
Chase Geoffrey L.
GEC Inc.
O'Connor Pamela A.
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