Cleaning and liquid contact with solids – Processes – Including use of vacuum – suction – or inert atmosphere
Patent
1995-02-17
1998-02-03
El-Arini, Zeinab
Cleaning and liquid contact with solids
Processes
Including use of vacuum, suction, or inert atmosphere
134 254, B08B 500, B08B 502, B08B 504
Patent
active
057140111
ABSTRACT:
A method for the dynamic cleaning of semiconductor fabrication equipment and particularly quartzware with thermally activated diluted nitrogen trifluoride at elevated temperatures, typically at the process operation temperature, wherein the cleaning effluent is safely removed and cleaning by-products isolated or diluted to provide for efficient cleaning and rapid restarts of fabrication equipment so cleaned.
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"Utilizing a portable cycle purge nitrogen venturi for removal of process gases in semiconductor processing gas systems." J. P. Fournier and Michael E. Elta; J. Vac. Sci. Technol. A 10(5), Sep./Oct. 1992; pp. 3376, 3377.
J. P. Fournier and Michael E. Elta (Fournier et al.) "Utilizing a Portable Cycle Purge Nitrogen Venturi for Removal of Process Gases in Semi-Conductor Processing Gas Systems."; J. Vac. Sci. Technol. A 10(5), Sep./Oct. 1992; pp. 3376, 3377.
Engle George Martin
Gibson Ronald James
Huling Bruce Alan
Schneider Charles Anthony
Air Products and Chemicals Inc.
Aspect Systems Inc.
Chase Geoffrey L.
El-Arini Zeinab
GEC Inc.
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