X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
Inventor
active
Beam conditioning system
Beam conditioning system with sequential optic
Multilayer optics with adjustable working wavelength
Multiple corner Kirkpatrick-Baez beam conditioning optic assembl
Protective layer for multilayers exposed to x-rays
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Profile ID: LFUS-PAI-P-951635