X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1998-02-19
2000-01-11
Hajec, Donald
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 84, 378156, G21K 106
Patent
active
060144238
ABSTRACT:
An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein the x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multi-layer Bragg x-ray reflective surfaces.
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Improved Prompt Gamma Neutron Activation Analysis Facility Using a Focused Diffracted Neutron Beam-1998 Elsvier Science B.V.
Gutman George
Jiang Licai
Verman Boris
Hajec Donald
Osmic, Inc.
Schwartz Michael J.
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