4. Chemistry: electrical and wave energy
  5. Processes and products
  6. Coating, forming or etching by sputtering

Barry L. Chin

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Apparatus for preventing deposition on frontside peripheral regi

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Apparatus for supporting a substrate and introducing gas flow do

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Atomic layer deposition apparatus

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate

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Atomic layer deposition apparatus

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate

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Atomic layer deposition apparatus

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate

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Profile ID: LFUS-PAI-P-448201

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