4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Armando Iturralde

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Automatic film deposition control

Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined
Patent

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Automatic film deposition control method and system

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Non-product patterned particle test wafer and testing method the

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
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Profile ID: LFUS-PAI-P-150612

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