Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined
Patent
1997-07-18
1999-09-21
Nguyen, Nam
Coating processes
Measuring, testing, or indicating
Thickness or uniformity of thickness determined
427 10, 20419213, 324 715, B05D 314, C23C 1434
Patent
active
059551399
ABSTRACT:
A film deposition control system and method in which a deposition rate monitor and an ellipsometer are used to control the thickness of a thin film being deposited on a wafer. The ellipsometer is also used to detect the refractive index of the thin film being deposited, and the detected refractive index value is used to control the ratio of the reactive gases being injected into the processing chamber.
REFERENCES:
patent: 4379040 (1983-04-01), Gillery
patent: 4588942 (1986-05-01), Kitahara
patent: 4957605 (1990-09-01), Hurwitt et al.
patent: 5091320 (1992-02-01), Aspnes et al.
patent: 5126028 (1992-06-01), Hurwitt et al.
patent: 5131752 (1992-07-01), Yu et al.
patent: 5354575 (1994-10-01), Dagenais et al.
patent: 5494697 (1996-02-01), Blayo et al.
patent: 5503707 (1996-04-01), Maung et al.
patent: 5665214 (1997-09-01), Iturralde
Product brochure of Low Entrophy Systems, Inc. entitled 1000-IS, Full Wafer Imaging Interferometer.
Product brochure of Sycon Instruments, Inc., STM-100, Thickness/Rate Monitor.
Product brochure of Sycon Instruments, Inc. STC-200, Thin Film Deposition Controller.
Product brochure of Tylan Corporation, "FC-260 Series Mass Flow Controllers".
Product brochure of J. A. Woollam Co., Inc., "Multi-Wavelength In Situ Ellipsometer".
Publication of The Electrochemical Society, Inc., Extended Abstracts, vol. 95-1, Abstract 101, pp. 155-156, "Real-Time Optical Diagnositcs for 0.25 .mu.m Gate Etching Process Control: Optical Emission, Full Wafer Interferometry, and UV-Visible Ellipsometry" by J.T.C. Lee, et al.
Publication of Solid State Technology, Jul., 1979, An analysis of LPCVD System Parameters for Polysilicon, Silicon Nitride and Silicon Dioxide Deposition.
Nguyen Nam
Sony Corporation
Sony Electronics Inc.
VerSteeg Steven H.
LandOfFree
Automatic film deposition control does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Automatic film deposition control, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Automatic film deposition control will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-77989