Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1995-05-03
1997-09-09
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419213, 118690, 118712, 356369, C23C 1434
Patent
active
056652143
ABSTRACT:
A film deposition control system and method in which a deposition rate monitor and an ellipsometer are used to control the thickness of a thin film being deposited on a wafer. The ellipsometer is also used to detect the refractive index of the thin film being deposited, and the detected refractive index value is used to control the ratio of the reactive gases being injected into the processing chamber.
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Nguyen Nam
Sony Corporation
Sony Electronics Inc.
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