Image reversal negative working O-naphthoquinone diazide and cro

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

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430165, 430191, 430193, 430296, 430328, 430330, 430942, 430967, G03F 730

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active

052565220

ABSTRACT:
A process for converting a normally positive working photosensitive composition to a negative working composition is disclosed. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image. The image-reversal negative-working photoresists of this invention have superior storage stability and shelf life.

REFERENCES:
patent: 3046118 (1962-07-01), Schmidt
patent: 3148983 (1964-09-01), Endermann et al.
patent: 3264104 (1966-08-01), Reichel
patent: 3635709 (1972-01-01), Kobayashi
patent: 3640992 (1972-02-01), Sus et al.
patent: 3869292 (1975-03-01), Peters
patent: 4104070 (1978-08-01), Moritz et al.
patent: 4173470 (1979-11-01), Fahrenholtz et al.
patent: 4196003 (1980-04-01), Watanabe
patent: 4247616 (1981-01-01), Vikesland et al.
patent: 4259430 (1981-03-01), Kaplan et al.
patent: 4387152 (1983-06-01), Staglhofen
patent: 4397937 (1983-08-01), Clecak et al.
patent: 4404272 (1983-09-01), Stahlhofen
patent: 4407926 (1983-10-01), Stahlhofen
patent: 4438189 (1984-03-01), Geissler et al.
patent: 4439511 (1984-03-01), Stahlhofen
patent: 4439516 (1984-03-01), Cernigliaro et al.
patent: 4458000 (1984-07-01), Stahlhofen
patent: 4491628 (1985-01-01), Ito
patent: 4499171 (1985-02-01), Hosaka et al.
patent: 4526856 (1985-07-01), Lewis et al.
patent: 4550069 (1985-10-01), Pampalone
patent: 4555469 (1985-11-01), Erdmann et al.
patent: 4576901 (1986-03-01), Stahlhofen et al.
patent: 4581321 (1986-04-01), Stahlhofen
patent: 4600683 (1986-07-01), Greco et al.
patent: 4642282 (1987-02-01), Stahlhofen
patent: 4650743 (1987-03-01), Galloway
patent: 4732836 (1988-03-01), Potuin
patent: 4732837 (1988-03-01), Potvin
patent: 4929536 (1990-05-01), Spak et al.
patent: 5114816 (1992-05-01), Scheler et al.
Japanese Abstract JP036166 Mar. 13, 1981.
Japanese Abstract JP 173249 Oct. 29, 1981.
Japanese Abstract 54-116055.
Pederson, Structural Composition of Polymers Relative to Their Plasma Etch Characteristics; J. Electrochem Soc. vol. 129, No. 1, P.205-8.
MacDonald, et al.; Image Reversal: The Production of A Negative Image In a Positive Photoresist; IBM Corp. 1982;P114-117.
Levine, H. A. Positive Resist Speed Enhancing, IBM Technical Disclosure Bulletin, vol. 13, No. 4, Sep., 1970.

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