Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1997-10-17
1999-06-01
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430 30, 430942, G03C 500
Patent
active
059087331
ABSTRACT:
To provide a method of and an apparatus for electron beam exposure convenient to be applied to the hybrid exposure of a pattern with ultra-fine design rules, a method of electron beam exposure according to an embodiment of the invention comprises: a primary field dividing step (S2) for dividing a second pattern to be drawn into a plurality of fields having a size whereon an electron beam can be radiated with negligible biasing distortion; a primary fitting step for performing a fitting process (S3) for each of the plurality of fields, wherein cubic compensation equations are adjusted to fit compensation values with the optical distortion, and a fitting error after compensation being calculated; a primary field dividing step for performing a field dividing process (S5) for each of the plurality of fields whereof the fitting error is larger than a predetermined allowable range, wherein a concerning field is divided into a pair of sub fields and the fitting process is performed for each of the sub fields; and a sub field dividing step for repeating the field dividing process for each of the sub fields, the fitting error thereof larger than the predetermined allowable range and a size thereof larger than a predetermine minimum size.
NEC Corporation
Young Christopher G.
LandOfFree
Method of electron beam exposure for superimposing second patter does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of electron beam exposure for superimposing second patter, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of electron beam exposure for superimposing second patter will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-954327