Pulsed DC sputtering method of thin film magnetic disks

Details Pulsed DC sputtering method of thin film magnetic disks Pulsed DC sputtering method of thin film magnetic disks

1998-05-15

2000-02-01

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, 20419215, C23C 1432

Patent

active

060198761

ABSTRACT:
A method and apparatus for depositing an underlayer and/or a magnetic thin film layer on a data storage disk are described. The sputtering power is supplied in the form of pulses during the application of the underlayer and/or magnetic storage to periodically ignite the plasma and increase the charge-carrier density in the sputtering chamber. The repetition frequency and parameters for the pulses and pauses between pulses are adjusted to achieve a desired nominal value for the coercive field strength of the magnetic layer. Preferably the repetition frequency of the power switching is from 10 to 80 kHz and the ratio of pulse length to pulse pause is within 5:1 to 1:5.

REFERENCES:
patent: 4956070 (1990-09-01), Nakada et al.
patent: 5084152 (1992-01-01), Lin
patent: 5300205 (1994-04-01), Fritsche
patent: 5303139 (1994-04-01), Mark
patent: 5492745 (1996-02-01), Yokoyama
patent: 5507930 (1996-04-01), Yamashita et al.
patent: 5693198 (1997-12-01), Lal et al.
patent: 5762766 (1998-06-01), Kurita et al.
N. Tani et al., "Increase of Coercive Force in Sputtered Hard Disk", IEEE Trans. on Magnetics, vol. 26, No. 4, Jul. 1990, pp. 1282-1285.
S. Schulz et al., "A New Single Disk Coating System for Magnetic Disks", Society of Vacuum Coaters, 35th Annual Technical Conference Proceedings (1992), pp. 382-387.

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