Radiation imaging process for formation of contrast enhanced pat

Details Radiation imaging process for formation of contrast enhanced pat Radiation imaging process for formation of contrast enhanced pat

1988-10-21

1991-01-08

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430169, 430176, 430198, 430311, 430312, 430326, 430327, 430329, G03F 7016, G03F 7021, G03F 732

Patent

active

049835009

ABSTRACT:
Disclosed is a radiation sensitive composition which comprises a radiation sensitive compound decreased in absorption of radiation upon irradiation with radiation and an organic polymer which, upon being formed into a film, changes in its solubility and decreases in solubility in a desired solvent due to the presence of decomposition product of said radiation sensitive compound which is produced by irradiation with the radiation. A process of formation of pattern using said composition is also disclosed. Fine resist pattern of 0.5 .mu.m line-and-space patterns or less can be formed with sufficiently high contrast.

REFERENCES:
patent: 3443944 (1969-05-01), Wise
patent: 3733200 (1973-05-01), Takaishi et al.
patent: 4217407 (1980-08-01), Watanabe et al.
patent: 4663275 (1987-05-01), West et al.
patent: 4784936 (1988-11-01), White et al.
Research Disclosure, No. 13928, Nov. 1975, pp. 21, 22.

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