Photodelineable coatings from hydrogen silsesquioxane resin

Details Photodelineable coatings from hydrogen silsesquioxane resin Photodelineable coatings from hydrogen silsesquioxane resin

1991-04-22

1993-08-24

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430270, 430330, 430311, G03F 7075

Patent

active

052387879

ABSTRACT:
The present invention relates to a method of forming patterned coatings on substrates, especially electronic devices, by negative resist techniques. The method comprises applying a preceramic coating comprising hydrogen silsesquioxane resin and an initiator onto the substrate and then radiating a selected region of the coating for a time sufficient to cure the resin. The uncured coating is then rinsed away leaving the patterned coating.

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