Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent
1998-09-30
2000-03-21
Pham, Hoa Q.
Optics: measuring and testing
By configuration comparison
With comparison to master, desired shape, or reference voltage
3562375, G01B 1100
Patent
active
060409126
ABSTRACT:
A method and apparatus for detecting random layout structures sensitive to process induced pattern errors in semiconductor device manufacturing applies a first manufacturing process to a first wafer containing semiconductor devices. A second manufacturing process is applied to a second wafer containing semiconductor devices. The second manufacturing process is similar to, but different from the first manufacturing process. The first and second wafers are compared by image subtraction to detect systematic pattern defects in the semiconductor devices of one of the first and second wafers. After differences are detected, the layout is examined to determine whether the difference represents a defect. If so, the design rules of the layout can be changed to accommodate a wider process variation and improve processing yield.
REFERENCES:
patent: 4209257 (1980-06-01), Uchiyama et al.
patent: 4579455 (1986-04-01), Levy et al.
patent: 4680627 (1987-07-01), Sase et al.
patent: 4701859 (1987-10-01), Matsuyama et al.
patent: 4718767 (1988-01-01), Hazama
patent: 4774461 (1988-09-01), Matsui et al.
patent: 4778745 (1988-10-01), Leung
patent: 4860371 (1989-08-01), Matsuyama et al.
patent: 5767974 (1998-06-01), Higashiguchi et al.
Hopper C. Bradford
Zika Steven J.
Advanced Micro Devices , Inc.
Pham Hoa Q.
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