Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent
1998-08-27
2000-03-21
Font, Frank G.
Optics: measuring and testing
By configuration comparison
With comparison to master, desired shape, or reference voltage
382144, G01B 1100
Patent
active
060409118
ABSTRACT:
A reference image forming method is used in a pattern inspection apparatus for scanning a pattern formed on an object to be inspected on the basis of design data with a laser beam having a predetermined wavelength, focusing transmitted light passing through the object on a light-receiving element by using an objective lens, forming a real image from pattern information obtained from the light-receiving element, and comparing the real image with a reference image obtained by imaging the design data, thereby detecting a defect in the object. In this method, reference data is formed by developing the design data as a pattern made of multilevel gradation values on pixels having a resolution higher than an inspection resolution. A reference image is formed by increasing or decreasing the width of each pattern of the reference data as a multilevel gradation pattern with a precision higher than the inspection resolution on the basis of an edge position of a corresponding pattern in the real image. A pattern inspection apparatus is also disclosed.
REFERENCES:
patent: 4202631 (1980-05-01), Uchiyama et al.
patent: 5307421 (1994-04-01), Darboux et al.
patent: 5475766 (1995-12-01), Tsuchiya et al.
Nishii Satoshi
Nozaki Takeo
Font Frank G.
NEC Corporation
Stafira Michael P.
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