Processing method and apparatus

Details Processing method and apparatus Processing method and apparatus

1995-04-25

1998-02-03

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430324, 430330, 216 41, 216 62, G03F 726

Patent

active

057143064

ABSTRACT:
A processing method comprises:

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Sekine et al., Draft Collection of Lectures in the 5th Dry Processing Symposium, 97 (1983).
R.A. Levy et al., "Characterization of LPCVD Aluminum for VLSI Processing" I. Electrochem. Soc., 131, 2175 (1984).
Electrochem. Soc., Draft Collections for 2d Symp. Jap. Branch, 75 (Jul. 7, 1989).
Research Reports XII on New Electronic Materials, Photoexcitation Processing Techniques Research Report 1, Jap. Electron. Indus. Symp. (Mar. 1986).
M. Taneya et al., "Photo-oxidation of GaAs for in situ patterned-mask formation prior to chlorine gas etching", Applied Physics Letters, vol. 56, No. 1, pp. 98-100 (Jan. 1, 1990).

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