Method and apparatus for fine processing

Details Method and apparatus for fine processing Method and apparatus for fine processing

1995-02-23

1996-11-12

Dodson, Shelley A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430325, 430326, 430327, 430945, 156345, 33 2R, 33 12, 33 17A, G03C 500

Patent

active

055738915

ABSTRACT:
An apparatus for fine processing includes a support for supporting a material to be processed, an active layer forming device for forming an active layer on the surface of the material by irradiating the material with light in a reaction gas, a latent image forming device for selectively irradiating the active layer with energy in the reaction gas to form a latent image, a shield mask forming device for removing either the latent image layer or the active layer to form a shield mask and an etching device for etching the portion other than the mask portion using the portion left unetched as the shield mask.

REFERENCES:
patent: 4761199 (1988-08-01), Sato
patent: 4960675 (1990-10-01), Tsuo et al.
patent: 5024716 (1991-06-01), Sato
patent: 5024724 (1991-06-01), Hirono et al.

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