Polyvinylpyridine radiation resists

Details Polyvinylpyridine radiation resists Polyvinylpyridine radiation resists

1982-09-14

1984-10-02

Wong, Jr., Harry

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

20415914, 427 36, 427 44, 430269, 430281, 430966, 526265, C08F 2606

Patent

active

044748698

ABSTRACT:
Negative working resists, prepared from poly(vinylpyridine) polymers which exhibit good sensitivities to 20 keV electron beam radiation, are disclosed. The poly(vinylpyridine) polymers of this invention may contain alkyl substituents on the pyridine rings in ortho, meta or para positions with respect to the nitrogen atom within said ring.

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Billmeyer, J. Pol. Sci., Part C, No. 8, pp. 161-176 (1965).

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