Process for forming a positive pattern through deep ultraviolet

Details Process for forming a positive pattern through deep ultraviolet Process for forming a positive pattern through deep ultraviolet

1992-04-06

1994-04-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430330, 430331, G03F 730, G03F 732

Patent

active

053004043

ABSTRACT:
A pattern with good adhesiveness to a substrate and good shape and heat resistance can be formed by coating a pattern forming material comprising (a) a resin, (b) a photoacid generator and (c) a solvent on the substrate, exposing to deep UV light, and developing using a mixed solvent of tetramethylammonium hydroxide and an alcohol.

REFERENCES:
patent: 4384037 (1983-05-01), Hosaka et al.
patent: 4812880 (1989-03-01), Ogawa et al.
patent: 4968581 (1990-11-01), Wu et al.

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