Frame-supported pellicle for photolithography, comprising a fluo

Details Frame-supported pellicle for photolithography, comprising a fluo Frame-supported pellicle for photolithography, comprising a fluo

1992-10-08

1994-04-05

Ryan, Patrick J.

Stock material or miscellaneous articles

Structurally defined web or sheet

Edge feature

430 5, 428447, 428421, B32B 960

Patent

active

053003489

ABSTRACT:
An improvement is proposed in a frame-supported pellicle consisting of a frame member and a thin transparent polymer membrane adhesively bonded to the frame member used for dustproof covering of a photomask in a photolithograpic patterning work of electronic devices. The improvement comprises using a specific fluorocarbon group-containing organosiloxane-based polymeric composition as an adhesive for adhesively bonding the frame member and the polymer membrane. This adhesive is effective even when the polymeric membrane is formed from a fluorocarbon polymer which is hardly susceptible to adhesive bonding with conventional adhesives. In addition, the adhesive bonding by use of this specific adhesive is highly durable even under irradiation with ultraviolet light.

REFERENCES:
patent: 5073422 (1991-12-01), Konno et al.
patent: 5168001 (1992-12-01), Legare et al.

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