Process for preparing an ink jet head

Details Process for preparing an ink jet head Process for preparing an ink jet head

1988-12-02

1991-11-05

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419216, 20419223, 346140R, C23C 1434

Patent

active

050629379

ABSTRACT:
A process for preparing an ink jet head having a support, an electrothermal transducer provided on the support and having a heat-generating resistor and a pair of electrodes electrically connected to the heat-generating resistor, a first upper layer provided. on the electrothermal transducer, a second upper layer provided on the first upper layer and a liquid path communicated with a discharge opening for discharging liquid and formed on the support so as to correspond to the heat-generating portion of the electrothermal transducer formed between the pair of electrodes comprises the steps of:

REFERENCES:
patent: 4567493 (1986-01-01), Ikeda et al.
patent: 4720716 (1988-01-01), Ideda et al.
patent: 4723129 (1988-02-01), Endo et al.
patent: 4804974 (1989-02-01), Sugata et al.
B. Chapman, Glow Discharge Processes, John Wiley & Sons, New York, 1980, pp. 215-227.
L. I. Maissel, Handbook of Thin Film Technology, McGraw-Hill Book Co., New York, 1970, pp. 13-26 to 13-30.

Affiliated with

Also associated with

Rating

Process for preparing an ink jet head does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for preparing an ink jet head, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for preparing an ink jet head will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-496813