Method and apparatus for controlling the temperature of a gas di

Details Method and apparatus for controlling the temperature of a gas di Method and apparatus for controlling the temperature of a gas di

1998-02-19

2000-10-17

Nuzzolillo, Maria

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723I, 118723IR, C23F 102

Patent

active

06132552&

ABSTRACT:
A plasma process reactor is disclosed that allows for greater control in varying the functional temperature range for enhancing semiconductor processing and reactor cleaning. The temperature is controlled by splitting the process gas flow from a single gas manifold that injects the process gas behind the gas distribution plate into two streams where the first stream goes behind the gas distribution plate and the second stream is injected directly into the chamber. By decreasing the fraction of flow that is injected behind the gas distribution plate, the temperature of the gas distribution plate can be increased. The increasing of the temperature of the gas distribution plate results in higher O.sub.2 plasma removal rates of deposited material from the gas distribution plate. Additionally, the higher plasma temperature aids other processes that only operate at elevated temperatures not possible in a fixed temperature reactor.

REFERENCES:
patent: 4348577 (1982-09-01), Toyoda et al.
patent: 5500076 (1996-03-01), Jerbic
patent: 5576629 (1996-11-01), Turner et al.
patent: 5597439 (1997-01-01), Salzman
patent: 5620523 (1997-04-01), Maeda et al.
patent: 5792261 (1998-08-01), Hama et al.

Affiliated with

Also associated with

Rating

Method and apparatus for controlling the temperature of a gas di does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for controlling the temperature of a gas di, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for controlling the temperature of a gas di will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-464679