Cleaning method used in removing contaminants from a solid...

Details Cleaning method used in removing contaminants from a solid... Cleaning method used in removing contaminants from a solid...

2006-11-03

2010-12-07

Olsen, Allan (Department: 1716)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

Reexamination Certificate

active

07846264

ABSTRACT:
Disclosed herein is a gas distribution plate for use in a gas distribution assembly for a processing chamber, where the gas distribution plate is fabricated from a solid yttrium oxide-comprising substrate, which may also include aluminum oxide. The gas distribution plate includes a plurality of through-holes, which are typically crescent-shaped. Through-holes which have been formed in the solid yttrium oxide-comprising substrate by ultrasonic drilling perform particularly well. The solid yttrium oxide-comprising substrate typically comprises at least 99.9% yttrium oxide, and has a density of at least 4.92 g/cm3, a water absorbency of about 0.02% or less, and an average grain size within the range of about 10 μm to about 25 μm. Also disclosed herein are methods for fabricating and cleaning the yttrium oxide-comprising gas distribution plate.

REFERENCES:
patent: 4629537 (1986-12-01), Hsu
patent: 5011761 (1991-04-01), Cagnin et al.
patent: 5366585 (1994-11-01), Robertson et al.
patent: 5605637 (1997-02-01), Shan et al.
patent: 5651797 (1997-07-01), Laube
patent: 5680013 (1997-10-01), Dornfest et al.
patent: 5798016 (1998-08-01), Oehrlein et al.
patent: 5888884 (1999-03-01), Wojnarowski
patent: 5993594 (1999-11-01), Wicker et al.
patent: 6100633 (2000-08-01), Okumura et al.
patent: 6123791 (2000-09-01), Han et al.
patent: 6183897 (2001-02-01), Hartvigsen et al.
patent: 6237528 (2001-05-01), Szapucki et al.
patent: 6352611 (2002-03-01), Han et al.
patent: 6565984 (2003-05-01), Wu et al.
patent: 6592707 (2003-07-01), Shih et al.
patent: 6776873 (2004-08-01), Sun et al.
patent: 6805952 (2004-10-01), Chang et al.
patent: 6916559 (2005-07-01), Murakawa et al.
patent: 6942929 (2005-09-01), Han et al.
patent: 2001/0003271 (2001-06-01), Otsuki
patent: 2002/0110698 (2002-08-01), Singh
patent: 2002/0127853 (2002-09-01), Hubacek et al.
patent: 2002/0190652 (2002-12-01), Do et al.
patent: 2003/0203120 (2003-10-01), Tsukatani et al.
patent: 2005/0161061 (2005-07-01), Shih et al.
patent: 0293198 (1988-11-01), None
patent: HEI 3-287797 (1991-12-01), None
patent: 2001023908 (2001-01-01), None

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