Full spectrum adaptive filtering (FSAF) for low open area...

Details Full spectrum adaptive filtering (FSAF) for low open area... Full spectrum adaptive filtering (FSAF) for low open area...

2007-05-24

2010-06-29

Punnoose, Roy (Department: 2886)

Optics: measuring and testing

By configuration comparison

With projection on viewing screen

Reexamination Certificate

active

07746473

ABSTRACT:
A method for precise endpoint detection during etch processing of a substrate based on adaptive filtering of the optical emission spectrum (OES) data, even in low open area etching, is provided. Endpoint detection performed in this manner offers the benefits of increased signal-to-noise ratio and decreased computation costs and delay when compared to conventional endpoint detection techniques.

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PCT International Search Report and Written Opinion dated Apr. 27, 2009 for International Appl. No. PCT/US2008/085900.

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