Method of producing insulator thin film, insulator thin...

Details Method of producing insulator thin film, insulator thin... Method of producing insulator thin film, insulator thin...

2009-01-06

2009-11-24

Zarneke, David A (Department: 2891)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S785000, C257SE21192, C257SE21240

Reexamination Certificate

active

07622401

ABSTRACT:
A method of producing an insulator thin film, for forming a thin film on a substrate by use of the atomic layer deposition process, includes a first step of forming a silicon atomic layer on the substrate and forming an oxygen atomic layer on the silicon atomic layer, and a second step of forming a metal atomic layer on the substrate and forming an oxygen atomic layer on the metal atomic layer, wherein the concentration of the metal atoms in the insulator thin film is controlled by controlling the number of times the first step and the second step are carried out.

REFERENCES:
patent: 6174809 (2001-01-01), Kang et al.
patent: 6308909 (2001-10-01), McNeil et al.
patent: 2002/0146916 (2002-10-01), Irino et al.
patent: 2004/0266045 (2004-12-01), Mears et al.
patent: 2005/0184286 (2005-08-01), Mears et al.
patent: 2000-058832 (2000-02-01), None
patent: 2001-223215 (2001-08-01), None
patent: 2002-536272 (2002-10-01), None
patent: 2003-069011 (2003-03-01), None
patent: 2003-204061 (2003-07-01), None
patent: WO 02/23614 (2002-03-01), None
patent: WO 03/079405 (2003-09-01), None

Affiliated with

Also associated with

Rating

Method of producing insulator thin film, insulator thin... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing insulator thin film, insulator thin..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing insulator thin film, insulator thin... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4127591