Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2006-10-02
2009-10-06
Garbowski, Leigh Marle (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
07600212
ABSTRACT:
A method for synthesizing a photomask data set from a given target layout, including the following steps: (a) providing a set of target polygons for the target layout; (b) fitting a smooth curve to a target polygon of the set of target polygons, the curve having a set of etch-target points; (c) moving the etch target points according to a model of an etch process to produce a set of lithography-target points; and (d) synthesizing a photomask data set based on a model of a lithography process and the set of lithography-target points.
REFERENCES:
patent: 6194104 (2001-02-01), Hsu
patent: 6453457 (2002-09-01), Pierrat et al.
patent: 6553558 (2003-04-01), Palmer et al.
patent: 6961920 (2005-11-01), Zach
patent: 7043712 (2006-05-01), Mukherjee et al.
patent: 7278125 (2007-10-01), Nojima
patent: 7328425 (2008-02-01), Olsson et al.
patent: 7334212 (2008-02-01), Zach
patent: 7403649 (2008-07-01), Cai et al.
patent: 2006/0248495 (2006-11-01), Sezginer
patent: 2006/0248496 (2006-11-01), Sezginer et al.
patent: 2006/0248497 (2006-11-01), Huang et al.
patent: 2006/0248498 (2006-11-01), Sezginer et al.
Beale et al., “Multiple Stage Optical Proximity Correction,” SPIE vol. 5040, pp. 1202-1209, 2003.
Choi et al., “Hybrid PPC Methodology Using Multi-Step Correction And Implementation For The Sub-100nm Node,” Proc SPIE, vol. 5040, pp. 1176-1183, 2003.
Overmars, M.H. and E. Welzl, “Construction of Sparse Visibility Graphs,” Technical Report RUU-CS-87-9, Department of Computer Science, University of Utrecht, 1987 p. 4-21, 23-26.
Ghosh, S. K. and Mount, D. M. “An Output Sensitive Algorithm for Computing Visibility Graphs,” SIAM J. Comput. vol. 20, No. 5, pp. 888-910, Oct. 1991.
Lee, D. T., “Proximity and Reachability In The Plane,” Ph.D. Thesis and Tech Report ACT-12, Coordinated Science Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL, 1978 p. 1-150.
Kitzinger, J., “The Visibility Graph Among Obstacles: A Comparison of Algorithms,” M.S. Thesis, Department of Computer Science, University of Mexico, 2003 p. 1-62.
Cao Xuelong
Carrero Jesus
Percin Gokhan
Sezginer Abdurrahman
Yenikaya Bayram
Cadence Design Systems Inc.
Garbowski Leigh Marle
Sheppard Mullin Richter & Hampton LLP
LandOfFree
Method of compensating photomask data for the effects of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of compensating photomask data for the effects of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of compensating photomask data for the effects of... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4082415