Process and apparatus for depositing single-component or...

Coating processes – Coating by vapor – gas – or smoke

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S255700

Reexamination Certificate

active

07410670

ABSTRACT:
The invention relates to a method and device for depositing at least one layer on at least one substrate in a process chamber. Said layer comprises several components and is insulating, passivating or electrically conductive. The components are vaporized in a tempered vaporization chamber by means of non-continuous injection of a liquid starting material or a starting material dissolved in a liquid using a respective injector unit. Said vapor is guided to the process chamber by means of a carrier gas. It is important to individually adjust or vary the material flow parameters, such as injection frequency and the pulse/pause ratio and the phase relation of the pulse/pauses to the pulse/pauses of the other injector unit, determining the time response of the flow of material through each injector unit. The pressure in the process chamber is less than 100 mbars, the process chamber is tempered and several series of layers are deposited on the substrate during one process step.

REFERENCES:
patent: 6194229 (2001-02-01), Basceri
patent: 2001/0034123 (2001-10-01), Jeon et al.
patent: 2001/0041250 (2001-11-01), Werkhoven et al.
patent: 2002/0030246 (2002-03-01), Eisenbeiser et al.
patent: 2003/0003244 (2003-01-01), Rossman
patent: 2003/0139005 (2003-07-01), Song et al.
patent: 10057491 (2002-05-01), None
patent: 10114956 (2002-10-01), None
patent: 10156932 (2003-05-01), None
patent: 1038988 (2000-09-01), None
patent: 1069599 (2001-01-01), None
patent: 2002173777 (2002-06-01), None
patent: WO 00/63957 (2000-10-01), None
PCT International Search Report, Mar. 30, 2005, 3 pages.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process and apparatus for depositing single-component or... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process and apparatus for depositing single-component or..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and apparatus for depositing single-component or... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3999934

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.