Semiconductor circuit arrangement with trench isolation and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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Details

C438S243000, C438S734000, C257SE21209, C257SE21682, C257SE21703, C257SE27103, C257SE27112, C257SE29302

Reexamination Certificate

active

07368341

ABSTRACT:
An explanation is given of, inter alia, a circuit arrangement containing a trench which penetrates through a charge-storing layer (18) and a doped semiconductor layer (14). The trench simultaneously fulfils a multiplicity of functions, namely an insulating function between adjacent components, the patterning of the charge-storing layer and also the subdivision of doping layers of the semiconductor layer (14).

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patent: WO 02/39501 (2002-05-01), None

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