Illumination system particularly for microlithography

Details Illumination system particularly for microlithography Illumination system particularly for microlithography

2007-01-03

2008-03-25

Font, Frank G. (Department: 2883)

Radiant energy

Invisible radiant energy responsive electric signalling

With or including a luminophor

C250S372000, C250S455110, C250S461100, C250S50400H, C250S492100, C250S492200, C250S492220

Reexamination Certificate

active

07348565

ABSTRACT:
There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element is situated in or near a plane defined by the real entrance pupil.

REFERENCES:
patent: 4195913 (1980-04-01), Dourte et al.
patent: 4294538 (1981-10-01), Ban
patent: 4389115 (1983-06-01), Richter
patent: 4424589 (1984-01-01), Thomas et al.
patent: 4457618 (1984-07-01), Plummer
patent: 4651012 (1987-03-01), Clark et al.
patent: 4688932 (1987-08-01), Suki
patent: 4723154 (1988-02-01), Kuwayama
patent: 4736110 (1988-04-01), Awamura
patent: 4740276 (1988-04-01), Marmo et al.
patent: 5071240 (1991-12-01), Ichihara et al.
patent: 5148442 (1992-09-01), O'Neil et al.
patent: 5222112 (1993-06-01), Terasawa et al.
patent: 5339346 (1994-08-01), White
patent: 5353322 (1994-10-01), Bruning et al.
patent: 5361292 (1994-11-01), Sweatt
patent: 5402267 (1995-03-01), Furter et al.
patent: 5439781 (1995-08-01), MacDowell et al.
patent: 5440423 (1995-08-01), Ogura
patent: 5459547 (1995-10-01), Shiozawa
patent: 5512759 (1996-04-01), Sweatt
patent: 5581605 (1996-12-01), Murakami et al.
patent: 5644383 (1997-07-01), Mori
patent: 5647664 (1997-07-01), Hane{hacek over (c)}ka
patent: 5669708 (1997-09-01), Mashima et al.
patent: 5677939 (1997-10-01), Oshino
patent: 5686728 (1997-11-01), Shafer et al.
patent: 5715084 (1998-02-01), Takahashi et al.
patent: 5737137 (1998-04-01), Cohen et al.
patent: 5755503 (1998-05-01), Chen et al.
patent: 5796524 (1998-08-01), Oomura
patent: 5805356 (1998-09-01), Chiba
patent: 5846678 (1998-12-01), Nishigori et al.
patent: 5896438 (1999-04-01), Miyake et al.
patent: 5963305 (1999-10-01), Mizouchi
patent: 5993010 (1999-11-01), Ohzawa et al.
patent: 5995582 (1999-11-01), Terashima et al.
patent: 6072852 (2000-06-01), Hudyma
patent: 6081319 (2000-06-01), Ozawa et al.
patent: 6198793 (2001-03-01), Schultz et al.
patent: 6208707 (2001-03-01), Oshino
patent: 6229647 (2001-05-01), Takahashi et al.
patent: 6244717 (2001-06-01), Dinger
patent: 6255661 (2001-07-01), Braat
patent: 6339467 (2002-01-01), Sato
patent: 6400794 (2002-06-01), Schultz et al.
patent: 6426506 (2002-07-01), Hudyma
patent: 6438199 (2002-08-01), Schultz et al.
patent: 6498351 (2002-12-01), Kruizinga et al.
patent: 6507440 (2003-01-01), Schultz
patent: 6583937 (2003-06-01), Wangler et al.
patent: 6594334 (2003-07-01), Ota
patent: RE38438 (2004-02-01), Takahashi
patent: 6781671 (2004-08-01), Komatsuda
patent: 2001/0002155 (2001-05-01), Takahashi et al.
patent: 0066295 (1982-12-01), None
patent: 0359018 (1990-03-01), None
patent: 0 939 341 (1999-09-01), None
patent: 0939341 (1999-09-01), None
patent: 0 962 830 (1999-12-01), None
patent: 1026547 (2000-08-01), None
patent: 1 067 437 (2001-01-01), None
patent: 1 209 503 (2002-05-01), None
International Search Report, dated Mar. 23, 2004.
Murphy et al., “Synchrotron Radiation Sources and Condensers for Projection X-Ray Lithography”, Applied Optics, vol. 32, No 34, pp. 6920-6929 (Dec. 1, 1993).
“Handbook on Synchrotron Radiation”, Ernst-Echard Koch ed., pp. 140-145, 1098-1111 (1983).

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