Photosensitive composition and method for forming pattern...

Details Photosensitive composition and method for forming pattern... Photosensitive composition and method for forming pattern...

2007-05-22

2008-03-04

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S330000, C430S270100, C430S905000, C430S910000

Reexamination Certificate

active

07338755

ABSTRACT:
The photosensitive composition of the invention contains a polymer material having a group having a structure represented by following general formula (2), and a photo acid generator generating acid with an ultraviolet ray or an ionizing radiationwherein m represents an integer of 0 or more.

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Takuma Hojo, et al., “Recent Progress in New Acetal-based Resist for Electron Beam Lithography”, Journal of Photopolymer Science and Technolgoy, vol. 16, No. 3, 2003, pp. 455-458.

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