Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Electrical signal parameter measurement system
Reexamination Certificate
2007-10-23
2007-10-23
Tsai, Carol S. W. (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Electrical signal parameter measurement system
C702S118000, C118S712000, C156S345240, C156S345280, C216S059000, C216S061000, C700S108000, C700S121000, C438S009000
Reexamination Certificate
active
11424705
ABSTRACT:
Methods for determining characteristics of a plasma are provided. In one embodiment, a method for determining characteristics of a plasma includes obtaining metrics of current and voltage information for first and second waveforms coupled to a plasma at different frequencies, determining at least one characteristic of the plasma using the metrics obtained from each different frequency waveform. In another embodiment, the method includes providing a plasma impedance model of a plasma as a function of frequency, and determining at least one characteristic of a plasma using model. In yet another embodiment, the method includes providing a plasma impedance model of a plasma as a function of frequency, measuring current and voltage for waveforms coupled to the plasma and having at least two different frequencies, and determining ion mass of a plasma from model and the measured current and voltage of the waveforms.
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Hoffman Daniel J.
Mawari Tarreg
Pender Jeremiah T. P.
Shannon Steven C.
Applied Materials Inc.
Patterson & Sheridan LLP
Tsai Carol S. W.
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