4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...

Jeremiah T. P. Pender

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Chamber recovery after opening barrier over copper

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
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Method for determining plasma characteristics

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Electrical signal parameter measurement system
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Method for determining plasma characteristics

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Electrical signal parameter measurement system
Reexamination Certificate

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Method for determining plasma characteristics

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Electrical signal parameter measurement system
Reexamination Certificate

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Method for monitoring process drift using plasma...

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Electrical signal parameter measurement system
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Profile ID: LFUS-PAI-P-3083202

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