Method of producing rough polysilicon by the use of pulsed...

Details Method of producing rough polysilicon by the use of pulsed... Method of producing rough polysilicon by the use of pulsed...

2007-05-22

2007-05-22

Schillinger, Laura M. (Department: 2813)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S488000, C438S684000

Reexamination Certificate

active

10930443

ABSTRACT:
A method for depositing a rough polysilicon film on a substrate is disclosed. The method includes introducing the reactant gases argon and silane into a deposition chamber and enabling and disabling a plasma at various times during the deposition process.

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